Manikam, A., Rizal, M., Wara, T., & Azizi, M. (2021). Yield Improvement of Wafer Edge Die Defocus at Lithography Process for 0.16┬Ám CMOS Technology. International Journal Of Advanced Research In Technology And Innovation, 3(3), 65-79. Retrieved from https://myjms.mohe.gov.my/index.php/ijarti/article/view/15048